JIACO Instruments was founded in 2014 by two scientists from Delft University of Technology in the Netherlands, Prof. Kees Beenakker and Dr. Jiaqi Tang. JIACO invented the Microwave Induced Plasma (MIP) decapsulation technology, which offers advantages such as high etching selectivity, no etching damage, and the ability to preserve device functionality and original failure sites. It is widely used in the fields of semiconductor failure analysis and reliability testing.
Since the delivery of the first system in 2016, MIP has been adopted by nearly all leading semiconductor companies worldwide, becoming an established solution for addressing complex failure analysis and advanced packaging structures. MIP technology has also been recognised by industry bodies, JEDEC included MIP in its revision of the JESD22-B120 standard in 2022.
JIACO Instruments has over 30 papers published on MIP and plasma research, we are proud to show how the applications of our plasma decapsulation system keep growing. Recognized by the JEDEC standard in JESD22-B120, our patented MIP technology offers non-destructive decapsulation that preserves copper and silver wire integrity. Backed by a global service team, JIACO Instruments supports our customers worldwide with fast responses, and a high personal level of service.
In the course of continuous technological development, we have maintained close collaboration with MIP users, conducting in-depth research on various materials and structures such as copper, palladium-coated copper, silver, gold wire, 2.5D/3D packaging, gallium arsenide, RDL, SiP, PCB, and on complex failure issues such as contamination, corrosion, and EOS.
More than 30 related papers have been published at international conferences including ISTFA, IPFA, ECTC, and AEC.
But we are not stopping there, we are continuing to push the boundaries of Plasma decapsulation. Our joint research with DIFFER is accelerating this process even further.
Discover the new industry standard for semiconductor failure analysis
