JIACO Events

CAM Workshop 2026: MIP for 2.5D/3D advanced package sample preparation

JIACO Instruments presented at the 13th CAM Workshop in Halle, Germany, where Jiaqi Tang discussed the use of Microwave Induced Plasma (MIP) etching for 2.5D/3D advanced package sample preparation. The presentation focused on how localized MIP etching can support top-down, bottom-up and cross-sectional sample preparation workflows for advanced electronic components.

May 19, 2026

Advancing Sample Preparation for 2.5D/3D Packages

JIACO Instruments participated in the 13th CAM Workshop in Halle, Germany, which brought together specialists working in failure analysis and material diagnostics for electronic components.

During the technical program, Jiaqi Tang presented:

“Microwave Induced Plasma Etching for 2.5D/3D Advanced Package Sample Preparation”

The presentation demonstrated how localized Microwave-Induced Plasma etching can support controlled access to regions of interest across package-, die- and board-level failure analysis workflows.

Technical presentation

Applications Presented at CAM Workshop 2026

Application Areas

Automotive

  • High-Tg mold compound
  • Modules
  • Cu wire
  • BOAC
  • AEC-Q100/Q006 qualification

Aerospace & Communication

Aerospace
  • Radiation testing
  • Die extraction
  • PCB/COB
Communication
  • CSP
  • SAW/BAW filters
  • GaAs, GaN and SiC
  • Ag wire
  • SiP

High-Performance Computing

  • 2.5D and 3D packages
  • Chiplets
  • µbumps
  • Redistribution layers

Failure Analysis

  • Contamination
  • Corrosion
  • Passivation and die cracks
  • Migration
  • Electrical overstress
Shared process focus: localized, CF4-free Ar + O2 plasma etching for selective removal of overmold and underfill while preserving critical inorganic structures.

2.5D/3D Case Studies Discussed

01

Top-Down Failure Analysis of an Interposer Die

Localized overmold removal to provide access for EBAC while preserving the interposer metallization and laminate.

Hunt et al. · EDFAAO 2021
02

Bottom-Up Localized µbump Opening

Selective underfill removal at the package-substrate, interposer and GPU-die interfaces.

Sanchez et al. · ISTFA 2024
03

Bottom-Up Failure Analysis of a Processor Die

Mechanical grinding followed by MIP underfill removal to reduce the risk of overgrinding and losing the defect.

Tan et al. · IPFA 2023
04

Cross-Section µbump Analysis

Controlled underfill removal to expose long µbump chains for bump-shape, metallurgy and contact-integrity analysis.

Distelhurst et al. · ISTFA 2020
Conference recap

Looking Back at CAM Workshop 2026

CAM Workshop provided a focused setting for exchanging technical insights with specialists working on increasingly complex failure analysis and sample preparation challenges.

For JIACO Instruments, the workshop provided an opportunity to demonstrate how MIP and MIP+ technologies can support controlled material removal across advanced packages, semiconductor devices and board-level assemblies.

The applications presented showed how sample preparation can be adapted to the material stack, region of interest and analytical requirements of each sample.

To learn more about the applications presented or to discuss a related sample preparation challenge, contact the JIACO team at info@jiaco-instruments.com .

Let's Continue the Conversation

Thank you for visiting JIACO Instruments. Whether we met at a conference, exhibition, workshop or technical presentation, we look forward to continuing the conversation.

Our team supports engineers, researchers and failure analysis specialists with advanced semiconductor sample preparation, controlled material removal and access to critical structures.