CAM Workshop 2026

Advanced 2.5D and 3D packages deliver major gains in performance and density, but their complexity presents new challenges for failure analysis—particularly in sample preparation. This presentation highlights how Microwave Induced Plasma (MIP) enables precise, localized etching to expose regions of interest while preserving failure sites, with case studies spanning CoWoS and InFO packages, as well as the latest MIP+ developments for die- and board-level analysis.

JIACO Instruments will be presenting at the CAM Workshop, the workshop concentrating on failure analysis and material diagnostics of electronics components in Halle, Germany

On May 19th, our colleague Jiaqi Tang will give a presentation during the workshop entitled “Microwave Induced Plasma Etching for 2.5D/3D Advanced Package Sample Preparation”.

This presentation will discuss the application of Microwave Induced Plasma (MIP) in sample preparation workflows, where localized MIP etching is applied from top-down, bottom-up, and cross-sectional approaches. Package-level case studies will cover underfill removal to expose μbump and dies in CoWoS packages, and polyimide removal to expose copper RDL in InFO packages. Latest developments on MIP+ etching for die-level and board-level sample preparation will cover selective Si removal for backside access to Si die, GaN-on-Si die, and bridge die for fault isolation, as well as silicone sealant removal to access components on PCB board and flex cable.

You can register for CAM Workshop here: https://cam-workshop.de/registration/

We look forward to seeing you in Halle!

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