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๐—•๐—ฟ๐—ถ๐—ป๐—ด ๐—ฐ๐—ผ๐—ป๐˜€๐—ถ๐˜€๐˜๐—ฒ๐—ป๐—ฐ๐˜† ๐˜๐—ผ ๐˜†๐—ผ๐˜‚๐—ฟ ๐—ณ๐—ฎ๐—ถ๐—น๐˜‚๐—ฟ๐—ฒ ๐—ฎ๐—ป๐—ฎ๐—น๐˜†๐˜€๐—ถ๐˜€ย 

Acid decapsulation is fast becoming outdated. Microwave-Induced Plasma (MIP) technology uses oxygen or hydrogen-based recipes for selective etching, clearing away materials without damaging key components. This ensures your failure analysis goes right the first time, every time.ย ย  Download our whitepaper to learn more about MIP technology:ย Here!

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๐—›๐—ผ๐˜„ ๐˜๐—ผ ๐˜€๐˜‚๐—ฐ๐—ฐ๐—ฒ๐—ฒ๐—ฑ ๐—ฎ๐˜ ๐—ณ๐—ฎ๐—ถ๐—น๐˜‚๐—ฟ๐—ฒ ๐—ฎ๐—ป๐—ฎ๐—น๐˜†๐˜€๐—ถ๐˜€

Rapid and accurate failure analysis is vital for maintaining brand reputation and profitability. Time, cost and talent pressures mean you only have one chance to get it right. However, the standard decapsulation method of using acid risks destroying crucial evidence An alternative, targeted decapsulation method, allows you to both preserve samples and meet deadlines. We

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๐—๐—œ๐—”๐—–๐—ข ๐—œ๐—ป๐˜€๐˜๐—ฟ๐˜‚๐—บ๐—ฒ๐—ป๐˜๐˜€โ€™ ๐—œ๐—ฆ๐—ง๐—™๐—” ๐Ÿฎ๐Ÿฌ๐Ÿฎ๐Ÿฑ ๐—ฟ๐—ฒ๐—ฐ๐—ฎ๐—ฝ

The JIACO Instruments sales & applications teams have returned from a busy and insightful ISTFA 2025 where we met with many existing & potential customers on how we can support their localised decapsulation & etching challenges. This year ISTFA focused on advanced packaging, with the AMD keynote underlining a key trend in the growth in

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๐—œ๐—ฆ๐—ง๐—™๐—” ๐Ÿฎ๐Ÿฌ๐Ÿฎ๐Ÿฑ: ๐—ง๐—ผ๐—ผ๐—น๐˜€ ๐—ผ๐—ณ ๐˜๐—ต๐—ฒ ๐—ง๐—ฟ๐—ฎ๐—ฑ๐—ฒ!ย 

This Monday (17th of November), our colleagues Sarah Zerouali and Mark McKinnon presented โ€The Tools of the Tradeโ€ at JIACO Instruments booth (#715). They introduced ISTFAโ€™s attendees to the MIP and MIP+ machines and their applications, by highlighting two customer papers, which will be presented during ISTFA 2025. Brandon Capellini from Analog Devicesโ€˜ paper on Efficient Preparation of GaAs devices utilizing JIACOโ€™s MIP decapsulation.

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Ensure sample protection in your failure analysis

In semiconductor manufacturing, timely and accurate failure analysis is crucial. With increasing complexity and reliance on semiconductors, thereโ€™s no room for error with precious samples. Major brands demand precise identification of failures, often within 48 hours. While acid decapsulation seems quick, it risks destroying critical evidence. Avoid jeopardizing your relationship with suppliers and brands by

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Failure Analysis made easy

Operating at atmospheric pressure, Microwave-Induced Plasma (MIP) technology avoids over-etching and plasma ion bombardment, unlike acid methods or other plasma processes. Safely analyze copper or silver elements of semiconductors without interference. ๐——๐—ถ๐˜€๐—ฐ๐—ผ๐˜ƒ๐—ฒ๐—ฟ ๐—ฎ๐—น๐—น ๐˜๐—ต๐—ฒ ๐—ฏ๐—ฒ๐—ป๐—ฒ๐—ณ๐—ถ๐˜๐˜€ ๐—ผ๐—ณ ๐— ๐—œ๐—ฃ ๐˜๐—ฒ๐—ฐ๐—ต๐—ป๐—ผ๐—น๐—ผ๐—ด๐˜† ๐—ฏ๐˜† ๐—ฑ๐—ผ๐˜„๐—ป๐—น๐—ผ๐—ฎ๐—ฑ๐—ถ๐—ป๐—ด ๐—ผ๐˜‚๐—ฟ ๐˜„๐—ต๐—ถ๐˜๐—ฒ๐—ฝ๐—ฎ๐—ฝ๐—ฒ๐—ฟ: Here! Interested in learning more about our MIP machine and what solutions we have

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Download our whitepaper